Technical innovation in ArF resist material for LSI production to 90nm-era and beyond

Satoshi Takechi
Project Manager of Intellectual Property UNIT Standard Promotion Department, FUJITSU SEMICONDUCTOR LTD.

Koji Nozaki
Research Fellow of Devices and Materials Laboratories, FUJITSU LABORATORIES LTD.

Reason for award

For microfabrication of a large-scale integrated circuits (LSI), the photoengraving technique (photolithography) is indispensable. For the microfabrication, research and development of a photosensitive materials (photoresists) corresponding to the short wavelength of the light source to be used is necessary. ArF (argon fluoride)lithographic technique using ArF excimer laser with wavelength of 193 nm is shorter than that of conventional light sources was indispensable for LSI fabrication of the 90-nm generation required at the beginning of the 21st century.
Satoshi Takechi and Koji Nozaki proposed a concept of a new material using an adamantyl group for the first time in the world in 1990, while the resist comprising benzene rings which is effective at the wavelength becomes ineffective with the wavelength less than this. Then, a new resist material for ArF excimer laser lithography combining adamantyl groups, lactone groups and the like was put in practical use.
At present, this technique become the world standard, the number of patent citations is quite large. This resist material occupies the market size of 30 billion yen/year or more, in the semiconductor market of about 20 trillion yen, the market of LSIs produced using the resist is estimated to be 10 trillion yen per year.
For the above reason, Satoshi Takechi and Koji Nozaki shall be awarded the 10th Yamazaki-Teiichi Prize in Material.

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Pioneering research and longtime contribution for industrial approach on extreme ultraviolet lithography

Hiroo Kinoshita
Professor of Laboratory of Advanced Science and Technology for Industry, University of Hyogo
Former Principal Researcher of Atsugi Electrical Communication Laboratory, Nippon Telegraph and Telephone Corporation

Reason for award

Hiroo Kinoshita proposed the world's first extreme-ultraviolet lithography (EUVL) technology in 1986. Kinoshita, based on strong belief and strong leadership, has consistently made significant contributions to development of this technology by pioneering research and practical application research on EUVL for 25 years. Namely, such as the reduction exposure system using a multilayer film reflecting optical system, an optical system comprising an aspheric reflection mirror and a method for oblique-incidence to mask, reflecting mirror and reflective mask using Mo/Si multilayer, mask fabrication and inspection, as well as various resists etc., he proposed and demonstrated various element technologies or systems related technologies.
EUVL is regarded as the candidate to be the last lithography for microfabrication of semiconductors. The exposure tool, as a mass production level prototype (using Kinoshita's original technology) is globally introduced in the second half of this year; a mass production model will be shipped in two to three years. It is also expected that the related technology development towards practical application of fine semiconductor devices of 20 nm or less also will be advanced quickly.

Without Kinoshita's foresight, originality, and leadership over long period of time, manufacture of fine semiconductor device of 20 nm or less is impossible, his contribution to the semiconductor industry in the world, and his contribution to the related peripheral device industries (light source, resist, mask, etc.) which are specialties of Japan are unfathomable. Since it is the result of world-class large-scale research unique to Japan, Kinoshita shall be awarded the 10th Yamazaki-Teiichi Prize in Semiconductor and Semiconductor Devices.

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Development of high-speed atomic force microscope and its application to dynamic observation of biomoleculesy

Toshio Ando
Professor of School of Mathematics and Physics, College of Science and Engineering, Kanazawa University

Reason for award

To understand the relationship between structure and function of biomolecules as well as their functional mechanism, direct in-situ observation of the dynamically functioning biomolecules is necessary. To meet this demand, Toshio Ando developed a high-speed scanning microscope based on atomic force.
The time required to generate an image by a scanning probe microscope increases by the increment of the number of pixels which affects the image quality. There is a trade-off between the image quality and the image generation speed, and hence, there were limits in the image quality and imaging speed. Ando has overcome the limits and made it possible to directly observe movement of biomolecules in aqueous solutions.
To increase the imaging rate while maintaining the image quality, the sample height information at XY positions is acquired while the sample stage is accurately and quickly driven in the X, Y and Z directions with piezo actuators. When a micro probe approaches the sample surface, an atomic force is exerted between them. A minute displacement of the probe caused by the atomic force is optically detected while the feedback control system operates to drive the Z-piezo so that an appropriate magnitude of atomic force is always exerted. The X and Y-scanners move the sample two-dimensionally at a regular interval. To ensure the high image quality and scan speed, the two-dimensional scan should be quickly carried out while unwanted vibrations should be suppressed. To increase the speed of feedback scanning in the Z-direction, methods of active vibration damping and nonlinear control were used while the dynamic property of each element contained in the control system was improved. As a result, 10 to 25 images can be acquired per second, which is 300 to 750 times faster than the conventional image acquisition that takes about at least 30 seconds.
The achievement resulted in many papers and patents. The instrument has been manufactured by a company and used by researchers in the world.
As an example in the application studies, the imaging study on the molecular behavior of a membrane protein bacteriorhodopsin in response to light was reported in NATURE Nanotechnology.

The present achievement greatly contributes to the progress of biological science and therefore is suitable for the Yamazaki-Teiichi Prize in Measurement Science & Technology.

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Development of novel animal reproduction technology

Teruhiko Wakayama
Team Leader of Laboratory for Genomic Reprogramming ,Center for Developmental Biology, RIKEN

Reason for award

Teruhiko Wakayama engaged in research on reproduction technology of mammals, devised a clone animal producing method directly injecting somatic nuclei into ova, and produced a clone individual of mouse for the first time. Furthermore, adding various ideas, he has conducted technology development establishing embryonic stem cells from somatic cell via nuclear transfer. Thereby, he also succeeded in production of offspring from advanced age infertility, production of clone individuals from a long-term frozen body, and production of offspring from freeze-dried sperms. Almost all the cloned mice in the world are produced by the method developed Wakayama at present. Thus, Wakayama established the basic technology of animal reproduction, which is greatly expected for contribution to development of the livestock industries, such as gene resource conservation and production of excellent livestock. Therefore, Wakayama shall be awarded the 10th Yamazaki-Teiichi Prize in Biological Science & Technology.

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