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Figure 1. White-light interferometer.
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Features
White-light interferometry is a method for non-contact,
non-destructive three-dimensional measurement of a sample surface using
a high-intensity light source with a wide field of view, high vertical
resolution, and a large dynamic range.
Application Examples
Roughness of polished and deposited film surfaces such as
semiconductor wafers
Observation of defects and abnormal areas
Observation of fabricated structures and devices such as patterned
holes, trench bevels, and micro electro-mechanical systems (MEMS)
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Ball bearings, soldering bonding
Scratches, fractured surfaces, and die shapes of gear, cutters, and
steel plates
Roughness plated and friction surfaces
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Shapes of glass, optical and electrical components
Operational
principle and equipment configuration
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Figure 2. Surface analysis at high vertical resolution (left) using
an interferometer, and medium lateral resolution (right) using a
charge-coupled device (CCD) camera (>640 nm depending on the
objective lens)
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Data examples
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Figure 3. Observation of a ZnO film surface.
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Figure 4. Example analysis of Si/SiGe laminated sample surfaces
(cross-hatch pattern).
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Description of labelling and parameters:
Surface roughness analysis (filled plot):
Region of interest (ROI) within FOV: \(0.71
\times 0.53\ \text{mm}\) (“Size X, Size Y”)
Equidistant height curves indicated by colour
Surface roughness in terms of \(P_{\text{v}}\) , \(R_{\text{a}}\), and \(Z_{RMS}\) (see Eqs. (1)-(3)
below)
Arbitrary cross-sectional analysis (profile plot):
Cross section indicated by the white line in (1)
Horizontal axis=distance; Vertical axis=height
\(P_{\text{v}}\), \(R_{\text{a}}\), and \(Z_{RMS}\) along the white line
Bird’s eye view of the region in (1)
Intensity distribution plot
Shows intensity distribution of light scattered off the sample
surface
Optical microscopy does not yield surface roughness
Name and serial number of sample/file
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\[R_{a} = \frac{1}{N}\sum_{i}^{N}\left|
Z_{i} - Z_{\text{cp}} \right|\]
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(1) |
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\[P_{\text{V}} = h_{\text{max}} -
h_{\text{min}}\]
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(2) |
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\[d_{\text{RMS}} =
\sqrt{\frac{1}{N}\sum_{i}^{N}\left( Z_{i} - Z_{\text{cp}}
\right)^{2}}\]
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(3) |
where \(R_{a}\) is the average
height difference from the centre, \(P_{\text{V}}\) the maximum height
difference, \(d_{\text{RMS}}\) the root
mean square of the height difference from the centre, \(Z_{i}\) the height of data point \(i\), \(Z_{\text{cp}}\) the height of the centre,
and \(N\) the number of data
points.
Measurement specifications
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\(127 \times 152 \times 104\)
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\(w \times d \times h\) mm
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Stage load carrying capacity
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\(0.05 \times 0.07\ \sim\) \(5 \times 7\)
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\(xy\) direction. Depends on
objective lens magnification
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Items for enquiries
Purpose and scope of the analysis
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Quantity, availability of pre-analysis samples, sample
cuttability
Structure, shape, material, layer structure, film thickness, expected
roughness
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Desired delivery dates of preliminary and final results
Other relevant information
Caution
Measurement can be difficult in the following cases:
Weak reflection at the sample surface (laminated structure of
transparent and/or high-reflectance films, see Figure 5). In this case, only information at
the interface of the film with high reflectivity is detected, not any
unevenness. Measurement could be possible if the sample is coated.
Contact MST first.
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Figure 5. Sample with
high reflectance
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Sample surface reflectivity of 4% or less, such as a diffusively
reflecting surface or a surface with a steep step (see Figure 6). In this case, the height cannot be
measured because reflected light is not detected at the surface of the
sample.
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Figure 6. Sample with
diffuse reflectance and/or scattering from a structure.
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