[GDMS]Glow Discharge Mass Spectrometry

GDMS:Glow Discharge Mass Spectrometry

Feature

GDMS is a method for analysing the composition of solid samples and simultaneously performing a semi-quantitative analysis of impurities. The relative sensitivity factor (RSF) associated with the device is used for calculating the concentrations. The analytical value is semi-quantitative and calculated from the RSF and the ionic strengths of the main constituent element and the target element, respectively.

  • Bulk analysis from trace elements (parts per billion level) to main components.
  • Analysis by direction and distance on a μm scale, including thin film analysis.
  • Semiconductor and insulator analysis possible using conductive materials and supporting electrodes.
  • High mass resolution enables removal of interfering ions.
  • Measurement of any element except rare gases and elements lighter than Li.
  • Isotope ratio measurement.

Application Examples

Impurity Analysis Examples

  • Semiconductors
  • High-purity metals
  • Alloys
  • Plating films
  • Powder

Principle of operation

A glow discharge is initiated under Ar atmosphere with the sample as the cathode. When Ar atoms collide with the sample, its constituent elements are sputtered. Most of the sputtered elements are neutral but they are ionized by the Ar plasma. The ionized atoms are measured with a double-focusing mass spectrometer, and the ions are identified, and their concentrations calculated.

The sample processing method is selected according to type of sample and analysis purpose:

  • Pin cell method: Suitable for samples that are easy to process, such as bulk samples
  • Flat cell method: Thickness and directional analysis for samples with a flat surface
Principle of operation for the two sample processing methods.

Data examples

Example of analysis: Oxygen-Free Copper (OFC)

Concentration of various impurities in OFC (ppm by weight, normalized to Cu concentration).

*Values are RSF equivalent concentrations when Cu = 100 %.
*Elements in brackets are indicated by ionic strength ratios because their relative sensitivity coefficients are unknown.

Data format of deliverables

  • PDF file : Table of elements and their concentrations.

Specifications

  • Samples can be a powder or a bulk in the form of plates or pins. Samples will be processed if necessary.
  • Lower limit of detection: parts per billion (ppb) to parts per million (ppm), depending on the element and measurement conditions.
Sample specifications

Items for enquiries

  1. Purpose and contents of measurement
  2. Sample information
    • Number of samples, and availability of preliminary samples.
    • Dimensions, shape, assumed composition, film structure and thicknesses, processing (if any), and possibility of sample breakage (cutting, etc.).
    • Handling instructions.
    • Expected arrival date of sample(s) and shipping method.
  3. Details on delivery
    • Preferred due date for preliminary analysis report.
    • Due date for delivery of final report.
  4. Any other issues

Caution

  • Since the elements C, N, O are included in the background atmosphere of the equipment and in the Ar gas mixture, these elements cannot be analysed because they cannot be distinguished from the same elements present in the sample.
  • Since the impurity concentration is calculated assuming 100% concentration of the main component, the value of the main component is reported as “matrix” instead of its numerical value.
  • This analysis is carried out by an MST subcontractor.

Consultation and application for analysis

Our knowledgeable sales representatives will propose the most appropriate analysis plan.
Please feel free to contact us for a quote on the cost of your analysis.
For consultation and application, please use the inquiry form or call us.

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てむぞう&ますみん

Temuzo&Masumin